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-Tunable OPCPA Systems
-Lasers for 2P / 3P Microscopy
-Micromachining Lasers
-XUV HHG Sources
-Ho:YLF Gigawatt Lasers
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Material science & photo-electron spectroscopy
EUV / XUV imaging & metrology
Multiphoton microscopy
Attosecond science
OPCPA
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+49 (0)40 22863165
info@class5photonics.com
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Products
Products
Tunable OPCPA Systems
Lasers for 2-photon and 3-photon microscopy
Micromachining Lasers
XUV HHG Sources
Ho:YLF Gigawatt Lasers
All Products
White Dwarf 2p – two photon microscopy laser
Laser for 2-photon high-speed volumetric imaging
White Dwarf 3p – three photon microscopy laser
Laser for 3-photon deep-tissue imaging at highest frame-rates
White Dwarf TPA – two photon absorption laser for nanolithography
Most Powerful Laser for Two-Photon Absorption (TPA) Nanolithography.
White Dwarf HE – tunable high enery lasers for scientific applications
Few-cycle OPCPA for fundamental research
White Dwarf Attodriver – lasers for attosecond sciences
OPCPAs for XUV attosecond pulse generation
Supernova – high-power OPCPA ultrafast laser
Our flagship OPCPAs for highest pulse energies
Black Dwarf – Lasers for voltage 2-photon microscopy
Laser for 2P voltage imaging and micromachining
Black Dwarf – high power femtosecond lasers for micromachining
High-power femtosecond laser
Moonlander HHG – high harmonic beamlines and sources for EUV applications
EUV source & pump-probe suite
THORA 2050 – ultrafast high-energy 2 µm Ho:YLF laser
for mid-IR OPCPA, high-harmonic generation (HHG), and advanced spectroscopy.
Applications
Applications
Accelerate your research with our ultrafast, high-power laser systems and discover new frontiers in most demanding applications.
All Applications
Multiphoton microscopy
Advanced multi-photon microscopy (MPM) enables non-invasive imaging of deep cellular structures, enabling breakthroughs in neuroscience and cancer research.
Material science & photo-electron spectroscopy
Brilliant coherent EUV sources are essential tools for advanced material science such as time-resolved photo-emission spectroscopy and microscopy.
EUV / XUV imaging & metrology
The future throughput and precision in chip-making rely on fast metrology tools and next-generation photoresist materials in modern EUV lithography
Attosecond science
Attosecond science allows for deeper insights into material dynamics on the shortest time-scales and with nanometer-resolution.
OPCPA
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CLASS 5 PHOTONICS GmbH
Start-up Labs Bahrenfeld
on the DESY campus
Postal address:
Notkestr. 85
22607 Hamburg
Germany
Delivery address:
Luruper Hauptstr. 1
22547 Hamburg
Germany
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