Poster Alert: High repetition rate, high average power XUV sources based on High Harmonic Generation
At AttoX 2025, we’re excited to share our latest research in the poster:
“High Repetition Rate, High Average Power XUV Sources Based on High Harmonic Generation.”
This work is part of the collaborative MEGA EUV project, involving DESY, University of Hamburg, Class 5 Photonics, Amphos, and key industry partners. The project focuses on developing a next-generation Extreme Ultraviolet (EUV) light source driven by High Harmonic Generation (HHG). By combining high-repetition-rate femtosecond Yb lasers with efficient multipass cell compression, the project aims to enable reliable, high-flux 13.5 nm EUV generation—a critical wavelength for nanostructure metrology and EUV lithography.
Don’t miss the poster session at ATTOx, presented by Bastian Manschwetus, for a closer look at the experimental setup and results.
🗓️ Tuesday, July 8 at 13:00
The Loop – Science Village
Lund – Sweden
Key Highlights:
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Integration of high-power Yb:YAG Innoslab lasers and pulse compression for HHG
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Demonstrated µW-level XUV output at 13.5 nm with 20–50 W laser drivers
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Scalable path toward 600 W average power and <50 fs pulse durations
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Applications in high-speed scatterometry, semiconductor inspection, and ultrafast spectroscopy
This breakthrough promises fast, high-resolution inspections essential for EUV lithography and cutting-edge semiconductor manufacturing.
Read the full poster here: Poster_MEGAEUV
