20. October 2023

Abstract: Roadmap to High-Brilliance EUV and SXR Sources – Dr. Robert Riedel at the 2023 Source Workshop

A fantastic opportunity to delve into the transformative world of extreme ultraviolet (EUV) and soft-X-ray (SXR) sources, and to explore the future of high-brilliance photonics.

Roadmap to High-Brilliance EUV and SXR Sources

In recent years, the capabilities of extreme ultraviolet (EUV, 13.5 nm) and soft-X-ray (SXR, >285 nm) sources have greatly expanded, presenting transformative opportunities in the realms of metrology and advanced material studies. These technological advancements have the potential to provide deeper insights into the electron dynamics of photoresists and semiconductors. Such understanding is paramount in surmounting existing limitations and achieving superior resolution in lithographic processes.

The push towards these advancements is propelled by the combination of high-power femtosecond lasers with advanced nonlinear technologies. Among these, optical-parametric chirped-pulse amplifiers (OPCPA) and multi-pass cells (MPC) have shown significant promise. When synergized with high-power Yb-doped laser systems, these technologies have achieved breakthroughs in performance, reliability, and cost-effectiveness. The laser pulses generated by these state-of-the-art systems are of such intensity that they are now integral to experiments in high-harmonic generation (HHG). For HHG to effectively cater to the EUV and SXR ranges, specific driver wavelengths are mandated—approximately 1 µm for the EUV range and exceeding 1.6 µm for the SXR spectrum.

In this context, Class 5 Photonics stands at the forefront of innovation. We are excited to introduce and discuss our latest concepts and findings. This includes our compact 1 µm-wavelength lasers, which boast an impressive output of over 250 W and mJ-level pulse energies. On the larger scale, our mid-infrared systems operating at a 3 µm-wavelength demonstrate over 10 W output power with pulse energies at the 10 mJ level. Complementing these discussions, we will also present our initial results in EUV generation.

Presenting Author

Robert Riedel graduated in 2010 from Friedrich-Schiller-University Jena in Physics with a focus on photonic integrated circuits and femtosecond laser micromachining (Institute of Applied Physics). He received his PhD in 2013 at the University of Hamburg for his work at DESY, developing high-power femtosecond Lasers and EUV/soft- X-ray sources and metrology tools. While continuing his work at DESY from 2013 2015, he founded Class 5 Photonics with colleagues working in Hamburg, Germany and Stanford, USA. Together with his team, he received several innovation awards.

  More about our EUV / SXR Lasers  



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